Publication

Advanced Semiconductor Technology Laboratory

International journal
2022
164 Low-Frequency Noise Characteristics in HfO2-Based Metal-Ferroelectric-Metal Capacitors K.-S. Yim, S. Shin, C.-H. Jang and H.-Y. Cha Materials, Vol. 15, p.7475, Oct, 2022 DOI : 10.3390/ma15062097, ISSN : 1996-1944 LINK
163 Electrical Properties of 2H-Si Microwire Grown by Mixed-Source Hydride Vapor Phase Epitaxy S. Shin, K.-H Kim, G.-S. Lee, J.-H Lee, H.-S. Ahn and H.-Y Cha Results in Physics, Vol. 40, p.105857, Sep, 2022 DOI : 10.1016/j.rinp.2022.105857, ISSN : 2211-3797 LINK
162 Normally-Off β-Ga2O3 MOSFET with an Epitaxial Drift Layer C.-H. Jang, Gokhan Ataca and H.-Y. Cha Micromachines, Vol. 13, No. 8, p.1185, Jul, 2022 DOI : 10.3390/mi13081185, ISSN : 2072-666X LINK
161 Analysis of Hot Carrier Degradation in 0.25-um Schottky Gate AlGaN/GaN HEMTs S.-I. Cho, W.-H. Jang, H.-Y. Cha and H.-T. Kim Journal of Electromagnetic Engineering and Science, Vol. 22, No. 3, pp. 291~295, May, 2022 DOI : 10.26866/jees.2022.3.r.89, ISSN : 2671-7255(Print), 2671-7263(Online) LINK
160 Delta-Doped β-(Al0.17Ga0.83)2O3/Ga2O3 Double-Channel Heterostructure MODFETs Gokhan Atamaca and H.-Y. Cha Phys. Status Solidi A, p. 2100842, Apr, 2022 DOI : 10.1002/pssa.202100842, ISSN : 1862-6319(Online) LINK
159 β-(Al0.17Ga0.83)2O3 Delta-Doped Heterostructure MODFETs with an Ultrathin Spacer Layer and a Back-Barrier Layer: A Comprehensive Technology Computer-Aided Design Analysis Gokhan Atamaca and H.-Y. Cha Phys. Status Solidi A, p. 2100732 , Apr, 2022 DOI : 10.1002/pssa.202100732, ISSN : 1862-6319(Online) LINK
158 Temperature- and Frequency-Dependent Ferroelectric Chracteristics of Metal-Ferroelectric-Metal Capacitors with Atomic-Layer-Deposited Undoped HfO2 Films C.-H. Jang, H.-S. Kim, H.-T. Kim and H.-Y. Cha Materials, vol. 15, no. 6, p. 2097, Mar, 2022 DOI : 10.3390/ma15062097, ISSN : 1996-1944 LINK
157 On/Off-State Noise Characteristics in AlGaN/GaN HFET with AlN buffer layer K.-S. Im, U.-H. Choi, M.-H. Kim, J.-S. Choi, H.-S. Kim, H.-Y. Cha, S.-J. An and O.-H. Nam Applied Physics Letters, vol. 120, p. 012102, 2022 DOI : 10.1063/5.0074137, ISSN : 0003-6951 (print), 1077-3118 (online) LINK
2021
156 Operation of NO₂ Gas Sensors based on Pd-AlGaN/GaN HEMT up to 500 °C V.C. Nguyen, H.-Y. Cha, H. Kim Journal of Semiconductor Technology and Science, vol. 21, no. 6, pp.412-417, 2021 DOI : 10.5573/JSTS.2021.21.6.412 LINK
155 Analysis of Thermal Characteristics of AlGaN/GaN Heterostructure Field-Effect Transistors Using Micro-Raman Spectroscopy J.-S. Yoo, S.-K. Chang, G.-W. Jung, K.-H. Kim, T.-S. Kim, J.-H. Song, H.-Y. Cha and S.-W. Han Journal of nanoscience and nanotechnology, vol. 21, no. 11, pp. 5736-5741(6), Nov., 2021. DOI : 10.1166/jnn.2021.19491, ISSN : 1533-4880 (Print), 1533-4899 (Online) LINK
154 Proton Irradiation Effects on GaN-based Devices D.-M. Keum, H.-T. Kim and H.-Y. Cha Journal of Semiconductor Engineering, vol. 2, no. 1, pp.119-124, Mar, 2021. DOI : 10.22895/jse.2021.0002, ISSN : 2733-6719(Online) LINK
153 Room Temperature Operation of UV Photocatalytic Functionalizaed AlGaN/GaN Heterostructure Hydrogen Sensor J.-H. Choi, T.-H. Park, J.-H. Hur and H.-Y. Cha Nanomaterials, vol. 11, no. 6, p. 1422, 2021 DOI : 10.3390/nano11061422, ISSN : 2079-4991 LINK
152 Response Enhancement of Pt-AlGaN/GaN HEMT Gas Sensors by Thin AlGaN Barrier with the Source-Connected Gate Configuration at High Temperature T.-A. Vuong, H.-Y. Cha and H.-T. Kim Micromachines, vol. 12, no. 5, p. 537, 2021 DOI : 10.3390/mi12050537, ISSN : 2072-666X LINK
151 Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition I.-H. Hwang, M.-J. Kang, H.-Y. Cha, and K.-S. Seo Crystals, vol, 11, no. 4, p. 405, 2021 DOI : 10.3390/cryst11040405, ISSN : 2073-4352 LINK
150 Unidirectional Operation of p-GaN Gate AlGaN/GaN Heterojunction FET Using Rectifying Drain Electrode T.-H. Kim, W.-H. Jang, J.-H. Yim and H.-Y. Cha Micromachines, vol. 12, no. 3, p. 291, 2021 DOI : 10.3390/mi.12030291, ISSN : 2072-666X LINK

검색