Publication

Advanced Semiconductor Technology Laboratory

International journal
2019
10 Direct Current and Radio Frequency Characterizations of AlGaN/AlN/GaN/AlN Double-Heterostructure High-Electron Mobility Transistor (DH-HEMT) on Sapphire U. Choi, H.-S. Kim, K. Lee, D. Jung, T. Kwak, T. Jang, Y. Nam, B. So, M.-J. Kang, K.-S. Seo, M. Han, S. Choi, S. Lee, H.-Y. Cha, and O. Nam Physica Status Solidi (a), vol. 217, no. 7, p. 1900695, 2020. DOI : 10.1002/pssa.201900695, ISSN : 1862-6300 (Print), 1862-6319 (Online) LINK
9 Investigation of Stability and Power Consumption of an AlGaN/GaN Heterostructure Hydrogen Gas Sensor Using Different Bias Conditions J.-H. Choi, H. Kim, H.-K. Sung, and H.-Y. Cha Sensors, vol. 19, no. 24, p. 5549, 2019. DOI : 10.3390/s19245549, ISSN : 1424-8220 LINK
8 Influence of Oxygen-Plasma Treatment on In-Situ SiN/AlGaN/GaN MOSHEMT with PECVD SiO2 Gate Insulator G. Cho, H.-Y. Cha, and H. Kim Materials, vol. 12, no. 23, p. 3968, 2019. DOI : 10.3390/ma12233968, ISSN : 1996-1944 LINK
7 Growth Behavior of GaN on AlN for Fully Coalesced Channel of AlN-based HEMT U. Choi, K. Lee, T. Kwak, T. Jang, Y. Nam, D. Jung, B. So, H.-S. Kim, H.-Y. Cha, M.-J. Kang, K.-S. Seo, and O. Nam Japanese Journal of Applied Physics, vol. 58, no. 12, p. 121003, 2019. DOI : 10.7567/1347-4065/ab4df3, ISSN : 0021-4922 (Print), 1347-4065 (Online) LINK
6 Characterization of High-Performance InGaAs QW-MOSFETs with Reliable Bi-layer HfOxNy Gate Stack S.-K. Eom, M.-W. Kong, H.-Y. Cha, and K.-S. Seo IEEE Journal of the Electron Devices Society, vol. 7, pp. 908-913, 2019. DOI : 10.1109/JEDS.2019.2934745, ISSN : 2168-6734 LINK
5 Recessed AlGaN/GaN UV Phototransistor W.-H. Jang, H.-S. Kim, M.-J. Kang, C.-H. Cho, and H.-Y. Cha Journal of Semiconductor Technology and Science, vol. 19, no. 2, pp. 184-189, 2019. DOI : 10.5573/JSTS.2019.19.2.184, ISSN : 1598-1657 (Print), 2233-4866 (Online) LINK
4 Normally-off Recessed-gate AlGaN/GaN MOS-HFETs with Plasma Enhanced Atomic Layer Deposited AlOxNy Gate Insulator M.-J. Kang, S.-K. Eom, H.-S. Kim, C.-H. Lee, H.-Y. Cha, and K.-S. Seo Semiconductor Science and Technology, vol. 34, no. 5, p. 055018, 2019. DOI : 10.1088/1361-6641/ab10f1, ISSN : 0268-1242 (Print), 1361-6641 (Online) LINK
3 Investigation of Frequency-Dependent Permittivity Tunability of P(VDF-TrFE) Metal-Ferroelectric-Metal Capacitor S.-W. Han, C.-H. Lee, H. Shin, J.-H. Lee, and H.-Y. Cha Results in Physics, vol. 12, pp. 469-470, 2019. DOI : 10.1016/j.rinp.2018.11.089, ISSN : 2211-3797 LINK
2 Light-Shield Layers Free Photosensitive Inverters Comprising GaN-Drivers and Multi-Layered MoS2-Loads S. G. Seo, S.-W. Han, H.-Y Cha, S. Yang, and S. H. Jin IEEE Electron Device Letters, vol. 40, no. 1, pp. 107-110, 2019. DOI : 10.1109/LED.2018.2879908, ISSN : 0741-3106 (Print), 1558-0563 (Online) LINK
1 Atomic-Layer Deposition of Crystalline BeO on SiC S. M. Lee, Y. Jang, J. Jung, J. H. Yum, E. S. Larsen, C. W. Bielawski, W. Wang, J.-H. Ryou, H.-S. Kim, H.-Y. Cha, and J. Oh Applied Surface Science, vol. 469, pp. 634-640, 2019. DOI : 10.1016/j.apsusc.2018.09.239, ISSN : 0169-4332 LINK

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