Publication

Advanced Semiconductor Technology Laboratory

International journal
Temperature- and Frequency-Dependent Ferroelectric Chracteristics of Metal-Ferroelectric-Metal Capacitors with Atomic-Layer-Deposited Undoped HfO2 Films
Title Temperature- and Frequency-Dependent Ferroelectric Chracteristics of Metal-Ferroelectric-Metal Capacitors with Atomic-Layer-Deposited Undoped HfO2 Films
Info C.-H. Jang, H.-S. Kim, H.-T. Kim and H.-Y. Cha
Name Materials, vol. 15, no. 6, p. 2097, Mar, 2022
Link 관련링크 https://www.mdpi.com/1996-1944/15/6/2097 1749회 연결
Temperature- and Frequency-Dependent Ferroelectric Chracteristics of Metal-Ferroelectric-Metal Capacitors with Atomic-Layer-Deposited Undoped HfO2 Films

  • IEEE

  • Hongik
    University

  • Alimni

  • Professor

School of Electronic and Electrical Engineering
Hongik University
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