Publication

Advanced Semiconductor Technology Laboratory

International journal
Low-Frequency Noise Characteristics in HfO2-Based Metal-Ferroelectric-Metal Capacitors
Title Low-Frequency Noise Characteristics in HfO2-Based Metal-Ferroelectric-Metal Capacitors
Info K.-S. Yim, S. Shin, C.-H. Jang and H.-Y. Cha
Name Materials, Vol. 15, p.7475, Oct, 2022
Link 관련링크 https://www.mdpi.com/1996-1944/15/21/7475 113회 연결
Low-Frequency Noise Characteristics in HfO2-Based Metal-Ferroelectric-Metal Capacitors