Publication

Advanced Semiconductor Technology Laboratory

International journal
Low-Frequency Noise Characteristics in HfO2-Based Metal-Ferroelectric-Metal Capacitors
Title Low-Frequency Noise Characteristics in HfO2-Based Metal-Ferroelectric-Metal Capacitors
Info K.-S. Yim, S. Shin, C.-H. Jang and H.-Y. Cha
Name Materials, Vol. 15, p.7475, Oct, 2022
Link 관련링크 https://www.mdpi.com/1996-1944/15/21/7475 242회 연결
Low-Frequency Noise Characteristics in HfO2-Based Metal-Ferroelectric-Metal Capacitors

  • IEEE

  • Hongik
    University

  • Alimni

  • Professor

School of Electronic and Electrical Engineering
Hongik University
COPYRIGHT 2021 ASTL. ALL RIGHTS RESERVED.   Design by dsso.kr